Part of the DoW SBIR/STTR FY27 Release 2 topic list. Browse all 83 topics by industry or service.
Topic OSW27TZ02-NV001 from the DoW STTR 2027 BAA, Release 2. Pre-release now; proposals due January 6, 2027, 12:00 PM ET.
Quick answer
OSW27TZ02-NV001 is an Office of the Secretary of War STTR topic seeking wafer-scale, fabrication-ready thin films of a low-loss, naturally hyperbolic optical material that works from visible to telecommunication wavelengths. It is a Phase I STTR topic with a Phase II follow-on, and the work must be done with a research institution partner. Proposals are due January 6, 2027, 12:00 PM ET.
Solicitation at a glance
- Topic number: OSW27TZ02-NV001
- Official title: Wafer-scale low-loss hyperbolic optical material
- Agency: Office of the Secretary of War
- Program: STTR (DoW STTR 2027 BAA, Release 2)
- Award type: Phase I (see topic text for Phase II)
- Award amount: Not yet posted. OSW component instructions not available in DSIP as of Nov 5, 2026.
- CMMC level: Level 1
- ITAR: No
- Technology areas: Electronics, Sensors
- Pre-release (direct TPOC contact allowed): November 4 to December 2, 2026, 8:00 AM ET
- Opens in DSIP: December 2, 2026, 8:00 AM ET
- Proposals due: January 6, 2027, 12:00 PM ET
- Official source: DSIP Topics app (search OSW27TZ02-NV001)
BW&CO's take
What the Office of the Secretary of War wants
Hyperbolic materials can confine light far below the diffraction limit, but artificial metamaterials are lossy and hard to scale, and natural hyperbolic crystals work only in the infrared and exist as small research samples. There is no commercial source of wafer-scale, low-loss hyperbolic material at visible and telecom wavelengths compatible with standard semiconductor fabrication. Phase I must show feasibility of device-grade films with the right optical quality and crystal orientation, benchmark them against metamaterials, and identify a patterning approach. Phase II delivers films on substrates at least one inch across, with controlled thickness, orientation, and uniformity, reproducibly and with reasonable yield, plus demonstrated lithographic patterning and integration, benchmarked performance data, and a manufacturing-readiness and transition plan.
Who is a good fit
- Thin-film epitaxy or deposition experience with strongly anisotropic or layered crystals, with control of thickness and orientation at wafer scale
- A research institution partner with established expertise in optical measurement of hyperbolic materials
- Nanofabrication capability for lithographic patterning and integration of new optical materials
- Optical modeling and metrology to quantify loss and benchmark against artificial metamaterials
Watch-outs
- This is an STTR topic. The work must be performed in partnership with a research institution, and the topic encourages a partner with expertise in optical measurement of hyperbolic materials.
- The material must be naturally hyperbolic and low-loss across visible to telecom wavelengths. An artificial metamaterial approach does not match the stated objective.
- Phase II requires reproducible films of at least one inch with reasonable yield and a demonstrated path to larger wafers, so a Phase I plan should show a credible scaling route.
- The topic requires CMMC Level 1. It is not marked as ITAR-restricted in the topic metadata.
Think your company fits OSW27TZ02-NV001? Talk with BW&CO before the January 6 deadline.
Plan Your OSW27TZ02-NV001 Submission
Official topic text (verbatim from DSIP)
The text in this section is copied word for word from the official DSIP topic as published on November 4, 2026. DSIP is the official source and topics can be amended. Always confirm the current version at dodsbirsttr.mil before you submit. Our commentary above is BW&CO's interpretation, not Government guidance.
Title
Wafer-scale low-loss hyperbolic optical material
Objective
The overall goal of the R&D effort is to develop wafer-scale, fabrication-ready thin films of a low-loss naturally hyperbolic optical material that operates across the visible to telecommunication wavelength range. Films should be of high optical and crystalline quality, with controlled thickness and orientation, on substrates at least one inch in cross-sectional diameter.
Description
Conventional optical systems are limited by diffraction, which sets the smallest features they can pattern, image, or confine to roughly the wavelength of the light used. A class of strongly anisotropic, or "hyperbolic," optical materials can confine and route light far below this limit, enabling a family of compact, low size-weight-and-power photonic components of direct interest to OUSW (R&E). Hyperbolic behavior has historically been realized in artificial metamaterials, which are optically lossy, and difficult to fabricate and scale. Certain naturally occurring crystals exhibit the same behavior with far lower loss, but the available examples operate only in the infrared and have been produced only as small, research-grade crystals by batch methods incompatible with standard microfabrication. There is presently no commercial source of wafer-scale, low-loss hyperbolic material that operates at visible and telecommunication wavelengths in a form compatible with standard semiconductor fabrication, and it is important for the Air Force to establish a domestic supply source for such a material.
Phase I
Establish the feasibility of producing the hyperbolic material as wafer-scale, device-grade thin films with the required optical quality and crystalline orientation across the target wavelength range. Characterize and/or predict the optical performance of the films and benchmark it against existing artificial metamaterial approaches. Identify a viable approach for lithographically patterning and integrating the material.
As a Small Business Technology Transfer (STTR) effort, the work must be performed in partnership with a research institution; a partner with established expertise in optical measurement of hyperbolic materials is encouraged. Deliverables include a feasibility assessment with supporting analysis and/or preliminary data, quantitative performance projections, and a detailed Phase II plan. Documentation may comprise technical reports, peer-reviewed publications, measured data, and design artifacts sufficient to substantiate the scientific, technical, and commercial merit required to enter Phase II.
Phase II
Deliver wafer-scale films/wafers (at least one inch in cross-section, with a demonstrated path to larger wafers) of the low-loss hyperbolic material, with controlled thickness, orientation, and uniformity, reproducibly and with reasonable yield. Demonstrate lithographic patterning and integration of the material. Provide quantitative performance data benchmarked against incumbent approaches, together with a manufacturing-readiness and transition plan.
Phase III Dual Use Applications
The awardee will pursue commercialization of the technologies developed in Phase II, transitioning expanded capability to government and civilian users to microelectronics fabrication and inspection, compact optics and photonics, and/or quantum light sources. Direct access to end-users and government customers will be provided, with opportunities for Phase III awards for additional research and development or direct procurement of the products and services developed in coordination with the program. Phase III efforts are intended to transition technologies developed with further scaling of performance metrics for dual use applications into operational use and/or commercial markets, leveraging non-SBIR/STTR funding. Phase III work may include productization, integration, certification, and large-scale deployment of the capability developed in Phases I and II. By effectively executing Phase III effort and transitioning the technology into operational and commercial use, the project aims to maximize the impact and value of the STTR-funded R&D efforts, ultimately contributing to national security, economic growth, and technological innovation. A design for performance approach for defense system in partnership with a defense contractor and a design for cost for commercial applications will be planned.
References
A. Poddubny, I. Iorsh, P. Belov, Y. Kivshar, "Hyperbolic metamaterials," Nature Photonics 7, 948–957 (2013).
C. Liu, T. Liu, Z. Zhang, Z. Sun, G. Zhang, E. Wang, K. Liu, "Understanding epitaxial growth of two-dimensional materials and their homostructures," Nature Nanotechnology 19, 907–918 (2024).
Keywords
Hyperbolic materials; Subdiffractional optics; Integrated photonics; Nanolithography; Metrology; Quantum emitters; Wafer scale.
Frequently asked questions
What is OSW27TZ02-NV001?
It is an Office of the Secretary of War STTR topic, Wafer-scale low-loss hyperbolic optical material, seeking fabrication-ready thin films of a naturally hyperbolic optical material that operates from visible to telecommunication wavelengths on substrates at least one inch in diameter.
When is OSW27TZ02-NV001 due?
Proposals are due January 6, 2027, 12:00 PM ET. DSIP pre-release began November 4, 2026, and direct contact with the topic authors is allowed only until the topic opens on December 2, 2026, 8:00 AM ET.
Is this a Phase I or Direct-to-Phase II topic?
It is a Phase I STTR topic. Phase I establishes feasibility and delivers a feasibility assessment, quantitative performance projections, and a detailed Phase II plan. Phase II delivers wafer-scale films and demonstrates patterning and integration.
Why not use existing hyperbolic metamaterials or natural crystals?
The topic states that artificial metamaterials are optically lossy and difficult to fabricate and scale, while known natural hyperbolic crystals operate only in the infrared and have been produced only as small research-grade crystals by batch methods incompatible with standard microfabrication.